Andrew YICK, Andy CHANG, Calvin YANG, Supreet KHANAPET (Marvell - USA), Christian KARRAS, Tobias GNAUSCH (Jenoptik - Germany)
Yuki HIROSE, Kosuke YAMANISHI (Tokyo Electron Ltd. - Japan)
Victoria TRAN (Delphon Industries LLC - USA), Tomonao NAKASHIMA (Japan Electronic Material Corp - Japan)
Jiayi SHEN, Tak FUKUSHIMA (Tohoku University - Japan)
Jerry Broz, PhD
SWTest General Chair
Delphon - USA
Hiroto Yasuura, PhD
Vice Director-General, National Institute of Informatics - Japan
Shinya Akata
Deputy Senior General Manager of the Design & System Technological Platform Division, Sony Semiconductor Solutions Corporation - Japan
Tetsu Ozawa
General Manager of the Production & Quality Management Group, Product Engineering Division, Socionext Inc. - Japan
Session Chair: Eric Chia-Cheng Chang (Intel - USA)
Choon Beng SIA (FormFactor Inc - Singapore), Masa WATANABE (FormFactor Japan - Japan)
Shoichi MATSUO (Micron Memory Japan Inc. - Japan)
Andrew YICK, Andy CHANG, Calvin YANG, Supreet KHANAPET (Marvell - USA), Christian KARRAS, Tobias GNAUSCH (Jenoptik - Germany)
Session Chair: Clark Liu (MJC Taiwan - Taiwan)
Yuka HOMAN, Masataka KIMOTO, Shinji TANAKA (MICRONICS JAPAN CO.,LTD - Japan)
Masaharu TSUTA, Takaho TANIGAWA, Hiroki KOIKE, Shoji IKEDA, Tetsuo ENDOH (Tohoku University - Japan)
Osamu MORI, Ryoichi UTSUMI, Naoya KOISO, Shigeyuki SATO (Toei Scientific Industrial Co., Ltd.)
Tetsuo KAMIYA, Naoyoshi WATANABE (ADVANTEST Corporation)
Shinichi SAKUYAMA, Masatomo TAKAHASHI (Tokyo Seimitsu Co., Ltd.)
Zach HSIEH (MPI Corporation - Taiwan)
Session Chair: Alan Ferguson (Oxford Lasers, United Kingdom)
Adam KONICEK (Celadon Systems, Inc. - USA), Ching Too CHEN, Jeff GRUSZYNSKI, Chintankumar PATEL, Jocelyn HSIEH, Jonathon LEE (Chroma ATE, Inc. - USA)
Sandeep D'SOUZA (Elevate Semiconductor - USA)
Hiroki KITAMURA, Tomonao NAKASHIMA (Japan Electronic Material Corp - Japan)
Session Chair: Masatomo Takahashi (Tokyo Seimitsu Co., Ltd. - Japan)
Alan LIAO (FormFactor - USA), Takuji MIKI (Kobe University - Japan)
Victoria TRAN (Delphon Industries LLC - USA), Tomonao NAKASHIMA (Japan Electronic Material Corp - Japan)
Anton GAVRILOV, Geert GOUWY, Van Dievel MARC, Vercaigne GREGOR (imec - Belgium)
Session Chair: Alex Yang (MPI Corporation - Taiwan)
Kai SUZUKI, Masashi HOSHINO, Nobuyuki TOYODA (TESEC Corporation - Japan), Kiyotaka YAMANISHI, Masatomo TAKAHASHI, Naoya TAKEUCHI (Accretech - Japan), Noriyuki IWAMURO (University of Tsukuba - Japan
Giulia ROTTOLI, Dario VILLA (Technoprobe - Italy)
Yuki HIROSE, Kosuke YAMANISHI (Tokyo Electron Ltd. - Japan)
Session Chair: Nobuhiro Kawamata (FormFactor - Japan)
Yo NOZAKA (FICT Limited - Japan)
Takahiro YAGI (OKI Circuit Technology Co., Ltd. - Japan)
Jose MOREIRA, Michael OTT, Orkide BAIREUTHER, Merlin WALLNER (Advantest - Germany), Natsuki SHIOTA, Aritomo KIKUCHI (Advantest - Japan)
Session Chair: Nyi Nyi Thein (Western Digital Corporation - Japan)
Ondrej BETAK, Zdenek SIMERSKY (UNITES Systems a.s. - Czech Republic)
Takahisa YAMAGUCHI, Eiichi NAKAMURA, Noriyuki YOSHIDA, Shigekatsu KONO (Nippon Electric Glass Co.,Ltd. - Japan)
Tetsuya KATO, Suganuma RYOSUKE, Takada KAZUYASU (TANAKA KIKINZOKU KOGYO K.K. - Japan)
Klemens REITINGER (ERS electronic GmbH - Germany)
Chris STOKES (Oxford Lasers - United Kingdom)
Jose MOREIRA (Advantest - Germany)
Georg FRANZ (T.I.P.S. Messtechnik GmbH - Austria)
Ksenija VARGA, R HOLLY, T UHRMANN, T ZENGER (EV Group - Austria)
C LEE, Y KUO (EV Group - Taiwan)
C WANG, H CHANG, L CHANG, T YANG (ITRI Industrial Technology Research Institute - Taiwan)
D JANSSEN, M REYBROUCK, M VANDEVYVERE, N VAN HERCK, S VANCLOOSTER (FUJIFILM Electronic Materials (Europe) - Belgium)
Tak FUKUSHIMA (Tohoku University - Japan)
Jiayi SHEN, Tak FUKUSHIMA (Tohoku University - Japan)
Taiki AI, Sumika ARIMA, Takumi MAEDA, Koichi SUMIYA, Taiki ITO, Daisuke TAKADA (University of Tsukuba - Japan)
Takao SAEKI (Formfactor Inc - Japan)
Haruki OZAWA, Taiki ITO, Takuya MATSUZAWA, Sara HOSHINO, Kyo WATANABE, Sumika ARIMA (University of Tsukuba - Japan)
Tad ROKKAKU (Probe Innovation USA, LLC - USA)
Alice GHIDONI, Elia MISSAGLIA (Technoprobe - Italy), Michael OTT, Markus FAHRNER (Advantest - Germany)
Hiroyuki NAKAMURA (Nidec SV Probe - Japan)
Wai Kit K (Lincstech Co., Ltd. - Japan)
Hong Chul KIM, Gi Jung NAM (DAWON NEXVIEW - South Korea)
Alessia GALLI, Dario VILLA (Technoprobe - Italy)
Koichi ANDO (HIOKI E.E. CORPORATION - Japan)